Surface Chemical Etching Behavior of Lr-115 Type Ii Solid State Nuclear Track Detector
نویسندگان
چکیده
Solid State Nuclear Track Detectors (SSNTDs) are well known for the detection of ionizing radiation through track formation of heavy ionizing particles. The LR-115 detector is a commonly used SSNTD for the detection and measurement of Rn and its progeny. Several techniques of track revelation are known but, the chemical etching technique is the most frequently used in which tracks can be made visible under an optical microscope after chemical amplification via etching. So the surface chemical etching behavior of LR-115 polymer is an important parameter in the study of ionizing radiation. The surface chemical behavior is studied by etching process. The parameter studied is the thickness of polymeric sample for different time intervals at different temperatures and normality. The results are indicated in terms of bulk etch rate and an activation energy is determined.
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